Investigation of growth conditions, crystal structure and surface morphology of SmS films fabricated by MOCVD technique

Домашня сторінка
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Фізико-технічні та математичні науки
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Відділення фізики і астрономії
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Semiconductor Physics Quantum Electronics & Optoelectronics
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Semiconductor Physics Quantum Electronics & Optoelectronics, 1999, том 2
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Semicond. Physics Quantum Electronics & Optoelectronics, 1999, № 2
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Investigation of growth conditions, crystal structure and surface morphology of SmS films fabricated by MOCVD technique

Volodin, N.M. ; Zavyalova, L.V. ; Kirillov, A.I. ; Svechnikov, S.V. ; Prokopenko, I.V. ; Khanova, A.V.

Інший ID: PACS 81.15.G, 68.55.J, 61.66

URI: http://dspace.nbuv.gov.ua/handle/123456789/119064

Посилання: Investigation of growth conditions, crystal structure and surface morphology of SmS films fabricated by MOCVD technique / N.M. Volodin, L.V. Zavyalova, A.I. Kirillov, S.V. Svechnikov, I.V. Prokopenko, A.V. Khanova // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 78-83. — Бібліогр.: 9 назв. — англ.

Підтримка: The authors express their deep gratitude to professor G.A.Domrachev for valuable comments and to E.A Shchupak for synthesis of compounds.

Дата: 1999

Завантажень: 394

Investigation of growth conditions, crystal structure and surface morphology of SmS films fabricated by MOCVD technique

Анотація:

The polycrystalline SmS films were fabricated by MOCVD technique using a number of ditiocarbamates, synthesized by different techniques. The growth kinetics and temperature dependencies of the film growth rate are investigated, which allowed us to determine the activation energies and the reaction type. The investigations of the structure and surface morphology of films were carried out. The technological conditions are determined providing the fabrication of single-phase SmS films of cubic modification with the most ordered crystal structure.

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