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періодичних видань НАН України
Control of planar magnetron sputtering system operating modes by additional anode magnetic field
Репозиторій DSpace/Manakin
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Control of planar magnetron sputtering system operating modes by additional anode magnetic field
Інші назви:
Управление режимами работы планарной магнетронной распылительной системы дополнительным прианодным магнитным полем
Тема:
Низкотемпературная плазма и плазменные технологии
Посилання:
Control of planar magnetron sputtering system operating modes by additional anode magnetic field / A.A. Bizyukov, O.I. Girka, K.N. Sereda, V.V. Sleptsov, A.G. Chunadra // Вопросы атомной науки и техники. — 2010. — № 6. — С. 144-146. — Бібліогр.: 3 назв. — англ.
Підтримка:
This work was supported in part by The Foundation of Development & Modernization of Scientific and Educational Equipment of V.N. Karazin Kharkiv National University, project #29-10.
Дата:
2010
Переглядів:
1078
Завантажень:
621
Анотація:
The control of planar magnetron sputtering system operating modes by additional anode magnetic field was investigated. It was shown that additional anode magnetic field substantially affects to planar magnetron-sputtering system (MSS) balancing and allows adjusting the electron fluxes intensity to the operating surface. It was experimentally shown that the magnetic field intensity increasing stabilizes the low-current discharge. The magnetic field intensity increasing prevents the discharge extinction by the ignition of semi-self-maintained magnetron-type discharge in transverse anode magnetic field.
