Наукова електронна бібліотека
періодичних видань НАН України
періодичних видань НАН України
Control of planar magnetron sputtering system operating modes by additional anode magnetic field
Репозиторій DSpace/Manakin
JavaScript is disabled for your browser. Some features of this site may not work without it.
Control of planar magnetron sputtering system operating modes by additional anode magnetic field
Інші назви:
Управление режимами работы планарной магнетронной распылительной системы дополнительным прианодным магнитным полем
Тема:
Низкотемпературная плазма и плазменные технологии
Посилання:
Control of planar magnetron sputtering system operating modes by additional anode magnetic field / A.A. Bizyukov, O.I. Girka, K.N. Sereda, V.V. Sleptsov, A.G. Chunadra // Вопросы атомной науки и техники. — 2010. — № 6. — С. 144-146. — Бібліогр.: 3 назв. — англ.
Підтримка:
This work was supported in part by The Foundation of Development & Modernization of Scientific and Educational Equipment of V.N. Karazin Kharkiv National University, project #29-10.
Дата:
2010
Переглядів:
1093
Завантажень:
624
Анотація:
The control of planar magnetron sputtering system operating modes by additional anode magnetic field was investigated. It was shown that additional anode magnetic field substantially affects to planar magnetron-sputtering system (MSS) balancing and allows adjusting the electron fluxes intensity to the operating surface. It was experimentally shown that the magnetic field intensity increasing stabilizes the low-current discharge. The magnetic field intensity increasing prevents the discharge extinction by the ignition of semi-self-maintained magnetron-type discharge in transverse anode magnetic field.
