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dc.contributor.author |
Boltovets, N.S. |
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Ivanov, V.N. |
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Konakova, R.V. |
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Kudryk, Ya.Ya. |
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Milenin, V.V. |
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Lytvyn, O.S. |
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Lytvyn, P.M. |
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Vlaskina, S.I. |
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Agueev, O.A. |
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Svetlichny, A.I. |
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Soloviev, S.I. |
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dc.contributor.author |
Sudarshan, T.S. |
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dc.date.accessioned |
2017-05-28T17:42:31Z |
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dc.date.available |
2017-05-28T17:42:31Z |
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dc.date.issued |
2004 |
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dc.identifier.citation |
SiC Schottky-barrier diodes formed with TiBx and ZrBx amorphous layers / N.S. Boltovets, V.N. Ivanov, R.V. Konakova, Ya.Ya. Kudryk, V.V. Milenin, O.S. Lytvyn, P.M. Lytvyn, S.I. Vlaskina, O.A. Agueev, A.I. Svetlichny, S.I. Soloviev, T.S. Sudarshan // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 60-62. — Бібліогр.: 8 назв. — англ. |
uk_UA |
dc.identifier.issn |
1560-8034 |
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dc.identifier.other |
PACS: 85.30.Kk |
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dc.identifier.uri |
http://dspace.nbuv.gov.ua/handle/123456789/118115 |
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dc.description.abstract |
Electrical and structural properties of Schottky-barrier diodes formed with TiBx and ZrBx amorphous layers on n-6H-, 15R- and 4H-SiC (with epi-layer) were studied. High thermal stability of ideality factors and barrier heights in the formed contacts was explained by the thermal stability of an interface TiBx(ZrBx)-SiC after rapid thermal annealing at 800°N for 60 s. |
uk_UA |
dc.language.iso |
en |
uk_UA |
dc.publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
uk_UA |
dc.relation.ispartof |
Semiconductor Physics Quantum Electronics & Optoelectronics |
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dc.title |
SiC Schottky-barrier diodes formed with TiBx and ZrBx amorphous layers |
uk_UA |
dc.type |
Article |
uk_UA |
dc.status |
published earlier |
uk_UA |
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