Impact of N₂+H₂ mixture plasma on carbon-containing film

dc.contributor.author	Voitsenya, V.S.
dc.contributor.author	Masuzaki, S.
dc.contributor.author	Motojima, O.
dc.contributor.author	Sagara, A.
dc.contributor.author	Jacob, W.
dc.date.accessioned	2015-05-25T16:01:19Z
dc.date.available	2015-05-25T16:01:19Z
dc.date.issued	2006
dc.identifier.citation	Impact of N₂+H₂ mixture plasma on carbon-containing film / V.S. Voitsenya, S. Masuzaki, O. Motojima, A. Sagara, W. Jacob // Вопросы атомной науки и техники. — 2006. — № 6. — С. 141-143. — Бібліогр.: 16 назв. — англ.	uk_UA
dc.identifier.issn	1562-6016
dc.identifier.other	PACS: 82.33.Xj
dc.identifier.uri	http://dspace.nbuv.gov.ua/handle/123456789/82153
dc.description.abstract	The short review is done of published data on impact of plasma produced in the N₂+H₂ mixture on carbon and organic films. It is concluded that such plasma can be much more effective in cleaning of the walls of fusion devices from a carbon-based contaminating deposit in comparison with plasmas of discharges in H₂, Ar or He.	uk_UA
dc.language.iso	en	uk_UA
dc.publisher	Національний науковий центр «Харківський фізико-технічний інститут» НАН України	uk_UA
dc.relation.ispartof	Вопросы атомной науки и техники
dc.subject	Plasma dynamics and plasma wall interaction	uk_UA
dc.title	Impact of N₂+H₂ mixture plasma on carbon-containing film	uk_UA
dc.type	Article	uk_UA
dc.status	published earlier	uk_UA