Vacuum method for creation of liquid crystal orienting microrelief

Домашня сторінка
→
Фізико-технічні та математичні науки
→
Відділення фізики і астрономії
→
Semiconductor Physics Quantum Electronics & Optoelectronics
→
Semiconductor Physics Quantum Electronics & Optoelectronics, 2003, том 6
→
Semicond. Physics Quantum Electronics & Optoelectronics, 2003, № 4
→
Переглянути статтю

dc.contributor.author	Kolomzarov, Yu.
dc.contributor.author	Oleksenko, P.
dc.contributor.author	Sorokin, V.
dc.contributor.author	Tytarenko, P.
dc.contributor.author	Zelinskyy, R.
dc.date.accessioned	2017-05-28T17:10:54Z
dc.date.available	2017-05-28T17:10:54Z
dc.date.issued	2003
dc.identifier.citation	Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ.	uk_UA
dc.identifier.issn	1560-8034
dc.identifier.other	PACS: 42.79.Kr
dc.identifier.uri	http://dspace.nbuv.gov.ua/handle/123456789/118102
dc.description.abstract	A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated.	uk_UA
dc.language.iso	en	uk_UA
dc.publisher	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України	uk_UA
dc.relation.ispartof	Semiconductor Physics Quantum Electronics & Optoelectronics
dc.title	Vacuum method for creation of liquid crystal orienting microrelief	uk_UA
dc.type	Article	uk_UA
dc.status	published earlier	uk_UA