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dc.contributor.author |
Boyko, B.Т. |
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dc.contributor.author |
Khrypunov, G.S. |
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dc.contributor.author |
Yurchenko, G.V. |
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dc.date.accessioned |
2015-03-13T06:42:36Z |
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dc.date.available |
2015-03-13T06:42:36Z |
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dc.date.issued |
2000 |
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dc.identifier.citation |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ. |
uk_UA |
dc.identifier.issn |
1562-6016 |
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dc.identifier.uri |
http://dspace.nbuv.gov.ua/handle/123456789/78239 |
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dc.description.abstract |
Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure with adding of 4·10⁻³ µbar oxygen pressure during the first minute of condensation has the following electrical and optical characteristics: surface, resistance 6 Ω/ and transmittance in visible spectral range about 88%. The ZnO:Al films with such optical and electrical parameters are suitable for substrate configuration highly efficiency thin film solar cells on CuInSe₂ base. |
uk_UA |
dc.description.sponsorship |
This work has been supported by the INTAS-96-0206 Project of European Commission and 7IP 050129 Project of Swiss National Science Foundation. |
uk_UA |
dc.language.iso |
en |
uk_UA |
dc.publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
uk_UA |
dc.relation.ispartof |
Вопросы атомной науки и техники |
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dc.subject |
Пленочные материалы и покрытия |
uk_UA |
dc.title |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
uk_UA |
dc.type |
Article |
uk_UA |
dc.status |
published earlier |
uk_UA |
dc.identifier.udc |
537. 221:537.221 |
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