Наукова електронна бібліотека
періодичних видань НАН України
періодичних видань НАН України
Effects of electron irradiation on structure and bonding of SF₆ on Ru(0001)
Репозиторій DSpace/Manakin
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Effects of electron irradiation on structure and bonding of SF₆ on Ru(0001)
Тема:
Electronically Induced Phenomena: Low Temperature Aspects
Інший ID:
PACS: 79.20.La
Посилання:
Effects of electron irradiation on structure and bonding of SF₆ on Ru(0001) / N.S. Faradzhev, D.O. Kusmierek, B.V. Yakshinskiy, T.E. Madey // Физика низких температур. — 2003. — Т. 29, № 3. — С. 286-295. — Бібліогр.: 34 назв. — англ.
Підтримка:
We acknowledge valuable discussions with Prof. E. Carter. This work has been supported in part by the US National Science Foundation, Grant No. CHE 0075995.
Дата:
2003
Переглядів:
756
Завантажень:
555
Анотація:
Electron stimulated desorption ion angular distribution (ESDIAD) and temperature programmed desorption (TPD) techniques have been employed to study radiation-induced decomposition of fractional monolayer SF₆ films physisorbed on Ru(0001) at 25 K. Our focus is on the origin of F⁺ and F⁻ ions, which dominate ESD from fractional monolayers. F⁻ ions escape only in off-normal directions and originate from undissociated molecules. The origins of F⁺ ions are more complicated. The F⁺ ions from electron stimulated desorption of molecularly adsorbed SF₆ desorb in off-normal directions, in symmetric ESDIAD patterns. Electron beam exposure leads to formation of SFx (x = 0 - 5) fragments, which become the source of positive ions in normal and off-normal directions. Electron exposure > 10¹⁶ cm⁻ ² results in decomposition of the entire adsorbed SF₆ layer.
