Анотація:
In this work, the growth properties of Ge₁₋xSix epitaxial films grown on Ge
substrates were investigated. The structural perfection of the films was controlled by
electron diffraction, electron microscopic and X-ray diffraction methods. It has been
established that the surface structure of the sample Ge/Ge₁₋xSix changes after irradiation by
accelerated electrons Ф = 5×1016 cm⁻², and generated are surface defects which play the
role of traps for change carriers.