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Surface and electron structure of the 6H-SiC(0001)-(3×3) surface and ultrathin Ag films on Si(111) and Si(001)

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dc.contributor.author Gasparov, V.A.
dc.date.accessioned 2017-05-31T07:34:45Z
dc.date.available 2017-05-31T07:34:45Z
dc.date.issued 2011
dc.identifier.citation Surface and electron structure of the 6H-SiC(0001)-(3×3) surface and ultrathin Ag films on Si(111) and Si(001) / V.A. Gasparov // Физика низких температур. — 2011. — Т. 37, № 9-10. — С. 1073–1084. — Бібліогр.: 23 назв. — англ. uk_UA
dc.identifier.issn 0132-6414
dc.identifier.other PACS: 62.23.Eg, 68.35.B–, 68.37.Ef, 73.40.–c
dc.identifier.uri http://dspace.nbuv.gov.ua/handle/123456789/118774
dc.description.abstract Surface topographic (LEED, STM) and spectroscopic (ARUPS, XPS, STS) studies have been performed on the Si-terminated 6H-SiC(0001)-(3×3) surface and Ag superstructures and ultrathin films on Si(001) and Si(111) surfaces, using a scanning tunneling microscope (STM) in ultrahigh vacuum. Our results confirm that a 2D epitaxial metal growth is favored on Si(001) at low temperatures and a solid, two-domain Ag(111) film has been achieved at coverage’s as low as 10 ML. We have found that the films reveal a morphology with 3-dimensional features and with well defined honeycomb structure in between. An atomically flat Si(111)/Ag-(√3̅×√3̅)R30° surface has been modified by use of a scanning tunneling microscope (STM) in ultrahigh vacuum (UHV). High quality 6H-SiC(0001)-(3×3) and Si(111)-Ag(√3̅×√3̅)R30° over structures have been prepared and studied by means of ARUPS, XPS and LEED. The local density of states proportional to the normalized differential conductivity (dI / dV )/(I / V ) vs V spectra show a distinct bands of empty (–0.6 eV) and filled (0.65 eV) sites separated by 1.2 eV, for both areas. The results support a Mott–Hubbard-type model as used for the calculation of the density of states of 6H-SiC(0001)-(3×3) surface with Hubbard gap 1 eV. uk_UA
dc.description.sponsorship I wish to thank Wo. Richter for hospitality during stay in FSU-Jena and cooperation, M. Riehl-Chudoba and B. Schröter, for providing invaluable assistance, F. Bechstedt, R.M. Feenstra, M. Grioni, L.S.O. Johansson, G. Margaritondo, W.-D. Schneider and J.-M. Themlin, for helpful discussions. This work has been supported by the DFG grants [No. RI 650/4–1, No. 436RUS 113/112/D, SFB 196], the Russian Foundation of Basic Research grants [No. 96–02–17532], the Russian Scientific Program: Surface Atomic Structures [Grants No. 95–2.1, No. 4.10.99], RAS Program: New Materials and Structures (Grant 4.13 and B.7) and the Russian State Program of support of leading scientific schools (1160.2008.2). uk_UA
dc.language.iso en uk_UA
dc.publisher Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України uk_UA
dc.relation.ispartof Физика низких температур
dc.subject Тонкие пленки uk_UA
dc.title Surface and electron structure of the 6H-SiC(0001)-(3×3) surface and ultrathin Ag films on Si(111) and Si(001) uk_UA
dc.type Article uk_UA
dc.status published earlier uk_UA


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