The design and characteristics of a new combined magnetron-ion-beam sputtering system are presented. The system allows coating deposition both by means of magnetron discharge, and by sputtering of complex composite targets ...

The paper is devoted to investigation of spatial distributions of ion current density to a sample in technological set-up with magnetron sputtering system and ICP source. The dependence of the ion flux towards the processed ...

The investigation results of optimal conditions for synthesis of thin-film tantalum oxide dielectric coatings using the cluster multipurpose setup are presented. The set-up consist of DC magnetron, ICP source, and ...