Fullerene and fullerene-aluminum nanostructured films as sensitive layers for gas sensors

Домашня сторінка
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Фізико-технічні та математичні науки
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Відділення фізики і астрономії
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Semiconductor Physics Quantum Electronics & Optoelectronics
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Semiconductor Physics Quantum Electronics & Optoelectronics, 2009, том 12
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Semicond. Physics Quantum Electronics & Optoelectronics, 2009, № 3
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Fullerene and fullerene-aluminum nanostructured films as sensitive layers for gas sensors

Grynko, D. ; Burlachenko, J. ; Kukla, O. ; Kruglenko, I. ; Belyaev, O.

Інший ID: PACS 07.07.Df, 68.35.bp

URI: http://dspace.nbuv.gov.ua/handle/123456789/118877

Посилання: Fullerene and fullerene-aluminum nanostructured films as sensitive layers for gas sensors / D. Grynko, J. Burlachenko, O. Kukla, I. Kruglenko, O. Belyaev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 3. — С.287-289. — Бібліогр.: 10 назв. — англ.

Підтримка: This work was supported by Program of the National Academy of Sciences of Ukraine “Nanosystems, Nanomaterials and Nanotechnologies”.

Дата: 2009

Завантажень: 391

Fullerene and fullerene-aluminum nanostructured films as sensitive layers for gas sensors

Анотація:

The responses of quartz crystal microbalance (QCM) sensors coated by fullerene and fullerene-aluminum films to ethanol and water vapors are investigated. The possibility of controlling the adsorption properties of such films by inserting the aluminum and by ultraviolet irradiation that changes the film morphology in a definite way is demonstrated.

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