Показати простий запис статті
dc.contributor.author |
Lytvyn, P.M. |
|
dc.contributor.author |
Lytvyn, O.S. |
|
dc.contributor.author |
Dyachyns’ka, O.M. |
|
dc.contributor.author |
Grytsenko, K.P. |
|
dc.contributor.author |
Schrader, S. |
|
dc.contributor.author |
Prokopenko, I.V. |
|
dc.date.accessioned |
2017-05-31T05:16:38Z |
|
dc.date.available |
2017-05-31T05:16:38Z |
|
dc.date.issued |
2012 |
|
dc.identifier.citation |
Mechanical scanning probe nanolithography:
modeling and application / P.M. Lytvyn, O.S. Lytvyn, O.M. Dyachyns’ka, K.P. Grytsenko, S. Schrader, I.V. Prokopenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 321-327. — Бібліогр.: 23 назв. — англ. |
uk_UA |
dc.identifier.issn |
1560-8034 |
|
dc.identifier.other |
PACS 81.16.Nd |
|
dc.identifier.uri |
http://dspace.nbuv.gov.ua/handle/123456789/118721 |
|
dc.description.abstract |
The paper presents a study on modeling the mechanical interaction between the tip of a
scanning atomic force microscope (AFM) and surfaces of various types, which makes it
possible to optimize parameters and modes for mechanical AFM nanolithography. The
practical assessment of mechanical nanoprobe lithography based on the method of a
direct surface patterning was carried out during fabrication of functional elements for
molecular electronics. Polymethine dye nanowires of a specified configuration and the
cross-section 3×20 nm have been successfully formed in a multilayer
polytetrafluoroethylene/gold/silicon nanostructure. |
uk_UA |
dc.language.iso |
en |
uk_UA |
dc.publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
uk_UA |
dc.relation.ispartof |
Semiconductor Physics Quantum Electronics & Optoelectronics |
|
dc.title |
Mechanical scanning probe nanolithography: modeling and application |
uk_UA |
dc.type |
Article |
uk_UA |
dc.status |
published earlier |
uk_UA |
Файли у цій статті
Ця стаття з'являється у наступних колекціях
Показати простий запис статті