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Thermoelasticity in Ge due to nonuniform distribution of doping impurity studied by light polarization modulation technique

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dc.contributor.author Serdega, B.K.
dc.contributor.author Venger, Ye.F.
dc.contributor.author Nikitenko, Ye.V.
dc.date.accessioned 2017-05-27T17:42:19Z
dc.date.available 2017-05-27T17:42:19Z
dc.date.issued 1999
dc.identifier.citation Thermoelasticity in Ge due to nonuniform distribution of doping impurity studied by light polarization modulation technique / B.K. Serdega, Ye.F. Venger, Ye.V. Nikitenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 1. — С. 153-156. — Бібліогр.: 7 назв. — англ. uk_UA
dc.identifier.issn 1560-8034
dc.identifier.other PACS 61.72
dc.identifier.uri http://dspace.nbuv.gov.ua/handle/123456789/117956
dc.description.abstract Volume-gradient photovoltage and birefrigence caused by a difference of main mechanical stress components have been studied in the Ge-monocrystal with step-like distribution of the doping impurity concentration, N. The qualitative agreement between the function obtained by integration of the spatial dependence of the anisotropy and of the coordinate dependence of the photovoltage was observed. Using this fact, the conclusion is made that the features of thermoelastic mechanical stress can be distribution of expressed by the dependence |σz - σy| ~ d²N/dz². Remove selected uk_UA
dc.language.iso en uk_UA
dc.publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України uk_UA
dc.relation.ispartof Semiconductor Physics Quantum Electronics & Optoelectronics
dc.title Thermoelasticity in Ge due to nonuniform distribution of doping impurity studied by light polarization modulation technique uk_UA
dc.type Article uk_UA
dc.status published earlier uk_UA
dc.identifier.udc 535.3


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