Chemical-dynamic polishing of semiconductor materials based on Bi and Sb chalcogenides by using HNO₃–HCl solutions

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Фізико-технічні та математичні науки
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Відділення фізики і астрономії
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Semiconductor Physics Quantum Electronics & Optoelectronics
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Semiconductor Physics Quantum Electronics & Optoelectronics, 2011, том 14
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Semicond. Physics Quantum Electronics & Optoelectronics, 2011, № 2
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dc.contributor.author	Pavlovich, I.I.
dc.contributor.author	Tomashik, Z.F.
dc.contributor.author	Stratiychuk, I.B.
dc.contributor.author	Tomashik, V.M.
dc.contributor.author	Savchuk, O.A.
dc.contributor.author	Kravtsova, A.S.
dc.date.accessioned	2017-05-26T13:05:13Z
dc.date.available	2017-05-26T13:05:13Z
dc.date.issued	2011
dc.identifier.citation	Chemical-dynamic polishing of semiconductor materials based on Bi and Sb chalcogenides by using HNO₃–HCl solutions / I.I. Pavlovich, Z.F. Tomashik, I.B. Stratiychuk, V.M. Tomashik, O.A. Savchuk, A.S. Kravtsova // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 2. — С. 200-202. — Бібліогр.: 8 назв. — англ.	uk_UA
dc.identifier.issn	1560-8034
dc.identifier.other	PACS 77.84.Bw, 81.65.Cf, Ps
dc.identifier.uri	http://dspace.nbuv.gov.ua/handle/123456789/117719
dc.description.abstract	The chemical etching of Ві₂Те₃ and n-(Ві₂Те₃)₀.₉(Sb₂Te₃)₀.₀₅(Sb₂Se₃)0.05 and p- (Bi₂Te₃)₀.₂₅(Sb₂Te₃)₀.₇₂(Sb₂Se₃)₀.₀₃ crystals of solid solutions with HNO₃–HCl etchant compositions was investigated. The dependences of dissolution rate of these semiconductors on etchant composition, stirring, temperature and their shelf-time storage have been studied. It was shown that the process of dissolution of the investigated materials in the polishing solutions HNO₃–HCl is limited by the diffusion stages.	uk_UA
dc.language.iso	en	uk_UA
dc.publisher	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України	uk_UA
dc.relation.ispartof	Semiconductor Physics Quantum Electronics & Optoelectronics
dc.title	Chemical-dynamic polishing of semiconductor materials based on Bi and Sb chalcogenides by using HNO₃–HCl solutions	uk_UA
dc.type	Article	uk_UA
dc.status	published earlier	uk_UA