Перегляд за автором "Medvedev, A.V."

Сортувати за: Порядок: Результатів:

  • Deposition of refractory metal films with planar plasma ECR source 
    Fedorchenko, V.D.; Chebotarev, V.V.; Medvedev, A.V.; Tereshin, V.I. (Вопросы атомной науки и техники, 2007)
    The condition of the deposition of refractory metal and alloy films such as W, Mo, Ti, Ta, Cr, Ni, Fe₈₀B₂₀ with using ECR plasma source at the different magnitudes of bias voltage on targets and substrates were investigated. ...
  • HIgh heat flux plasma testing of ITER divertor materials under ELM relevant conditions in QSPA Kh-50 
    Makhlaj, V.A.; Garkusha, I.E.; Aksenov, N.N.; Kulik, N.V.; Landman, I.S.; Linke, J.; Medvedev, A.V.; Malykhin, S.V.; Chebotarev, V.V.; Pugachev, A.T.; Tereshin, V.I. (2010)
    Performed studies of plasma-surface interaction include measurements of plasma energy deposited to the material surface and determination of tungsten cracking threshold during repetitive ITER ELM-like plasma exposures in ...
  • Influence of multipolar magnetic field geometry of ECR planar plasma source on plasma parameters 
    Fedorchenko, V.D.; Chebotarev, V.V.; Garkusha, I.E.; Medvedev, A.V.; Tereshin, V.I.; Shevchuk, B.A. (Вопросы атомной науки и техники, 2008)
    The plasma parameters and its homogeneity were measured in ECR planar plasma source with multipolar magnetic field, which is created by three parallel magnetic bars of 12 cm in length consisted of set of the permanent ...