Показати простий запис статті

dc.contributor.author Sedláková, L.
dc.contributor.author Kolouch, A.
dc.contributor.author Hladík, J.
dc.contributor.author Spatenka, P.
dc.date.accessioned 2015-05-27T15:27:07Z
dc.date.available 2015-05-27T15:27:07Z
dc.date.issued 2006
dc.identifier.citation Investigation of thin films deposition into porous material / L. Sedláková, A. Kolouch, J. Hladík, P. Spatenka // Вопросы атомной науки и техники. — 2006. — № 6. — С. 207-209. — Бібліогр.: 6 назв. — англ. uk_UA
dc.identifier.issn 1562-6016
dc.identifier.other PACS: 52.77.Dq, 68.00.00
dc.identifier.uri http://dspace.nbuv.gov.ua/handle/123456789/82307
dc.description.abstract Although the direct contact of the treated material with the plasma is assumed by the plasma community as a necessary condition of successful plasma treatment, several references mention penetration of active species into the porous material. Hydrophylity enhancement has been observed even inside porous material. The aim of this study is experimental investigation of plasma. This work is aimed to experimental investigation of thin layers deposition on porous substrates. The porous substrate was simulated with a specimen made from two glass wafers, on the margins of which two difference strips of varying thickness were placed. These strips define the thickness of the slot in the middle. After the deposition the substrate was decomposed and the film deposited inner walls of the glass wafers was investigated. Layers were deposited by method PECVD used RF plasma from gas C2H2. The film thickness was measured in dependence on the distance from the margin into the centre of the slab by optical profilometer. Penetration dept was tested in dependence on deposition conditions and geometric configuration of the substrate. Depending on deposition conditions, the film deposition was observed even on the whole substrate. uk_UA
dc.description.sponsorship This project was supported by the GACR, project No. 202/05/2242 and Centrum, project No. 1M0577 uk_UA
dc.language.iso en uk_UA
dc.publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України uk_UA
dc.relation.ispartof Вопросы атомной науки и техники
dc.subject Low temperature plasma and plasma technologies uk_UA
dc.title Investigation of thin films deposition into porous material uk_UA
dc.type Article uk_UA
dc.status published earlier uk_UA

Файли у цій статті

Ця стаття з'являється у наступних колекціях

Показати простий запис статті


Розширений пошук


Мій обліковий запис