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Перегляд Вопросы атомной науки и техники, 2003 за темою "Low temperature plasma and plasma technologies"

Репозиторій DSpace/Manakin

Перегляд Вопросы атомной науки и техники, 2003 за темою "Low temperature plasma and plasma technologies"

Сортувати за: Порядок: Результатів:

  • Bizukov, A.A.; Borisko, V.N.; Kashaba, А.Е.; Sereda, К.D.; Yunakov, N.N.; Zinov’ev, D.V. (Вопросы атомной науки и техники, 2003)
    In the paper the problem of diamond-like films production by sputtering of a graphite target in the modified plasma accelerator with closed electrons drift is considered. The diamond-like films with thickness 40...400 nm ...
  • Zykova, A.V.; Dudin, S.V.; Polozhiy, K.I. (Вопросы атомной науки и техники, 2003)
    The technology of synthesis of multilayer coatings on the basis of alumina oxide and structures, like tricalcium phosphate and hydroxylapatite, was suggested by Reactive Ion-Beam Synthesis (RIBS) method in a same vacuum ...
  • Vdovin, V.S.; Zajtzev, B.V.; Kobetz, A.F.; Rudiak, B.I.; Bomko, V.A.; Lesnykh, M.S.; Zhuravlev, V.G.; Rashkovan, V.M.; Bazyma, L.A.; Basteev, V.A.; Belokon, V.I. (Вопросы атомной науки и техники, 2003)
    This paper is the extension of investigations of the RF engine designed for orientation and stabilization of the spacecrafts orbit, and it is undertaken for measuring of plasma parameters of RF discharge in the ionization ...
  • Azarenkov, N.A.; Egorov, A.M.; Maslov, V.I.; Onishchenko, I.N.; Frolova, D.Yu. (Вопросы атомной науки и техники, 2003)
    Ion crystal formation in non-equilibrium dusty plasma in a field of an electric probe is investigated in such conditions, at which in equilibrium plasma its formation is impossible.
  • Gasilin, V.V.; Kunchenko, V.V.; Nezovybat’ko, Yu.N.; Taran, A.V.; Taran, V.S.; Tereshin, V.I.; Shvets, O.M. (Вопросы атомной науки и техники, 2003)
    In the presentation we investigate the possibilities to deposit metallic and dielectric films on metal and dielectric materials by means of vacuum technology with application of high frequency (RF) electric fields. As a ...
  • Azarenkov, N.A.; Bizyukov, A.A.; Bizyukov, I.A.; Bobkov, V.V.; Kashaba, A.E.; Krieger, K.; Sereda, K.N.; Tarasov, I.K. (Вопросы атомной науки и техники, 2003)
    A new solid ion source is described. The ion source based on hollow-cylindrical magnetron sputtering discharge produces the beam of various solid ions (B, C, Si, Ti, V, Fe, Ni, Ta, W) which are then extracted by an ion ...
  • Zykov, A.V.; Polozhiy, K.I.; Farenik, V.I. (Вопросы атомной науки и техники, 2003)
    The combined inductive-capacitive RF discharge at low gas pressure is considered for a case of collisionless ion motion. The power distribution model in the combined RF discharge in case of two asymmetric RF electrodes is ...
  • Grekov, D.L.; Azarenkov, N.A.; Bizyukov, A.A.; Olefir, V.P. (Вопросы атомной науки и техники, 2003)
    The PR-1 device is the wide-aperture source of homogeneous plasma. It is using for plasma processing of big diameter samples such as parts of HF antenna and elements of vessel of fusion devices. The paper presented deals ...
  • Antonova, T.N.; Dudin, S.V.; Farenik, V.I. (Вопросы атомной науки и техники, 2003)
    The mathematical model of single cylindrical Langmuir probe describing dependence of ion current gathered by the probe on the basic parameters of ion-beam plasma, such as probe potential, cold and beam ion densities, ...
  • Zhovtyansky, V.A. (Вопросы атомной науки и техники, 2003)
    Electrodes vapour material transport characteristics in the free-burning electric arc and formation of its pressure gradients are investigated. It is shown that adequate defining of gas-dynamic characteristic of electric ...
  • Azarenkov, N.A.; Bizjukov, A.A.; Gapon, A.V. (Вопросы атомной науки и техники, 2003)
    Plasma technologies for the film deposition and etching based on the ion flows application are intensively elaborated and used now. Some of the most important requirements imposed on the ion flows are homogeneity and ...

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