Fedorchenko, V.D.; Chebotarev, V.V.; Medvedev, A.V.; Tereshin, V.I.
(Вопросы атомной науки и техники, 2007)
The condition of the deposition of refractory metal and alloy films such as W, Mo, Ti, Ta, Cr, Ni, Fe₈₀B₂₀ with using ECR plasma source at the different magnitudes of bias voltage on targets and substrates were investigated. ...