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dc.contributor.author |
Hsu-Hui Cheng |
|
dc.contributor.author |
Shiao-Shing Chen |
|
dc.contributor.author |
Kazuharu Yoshizuka |
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dc.contributor.author |
Yung-Chih Chen |
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dc.date.accessioned |
2018-02-19T20:33:47Z |
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dc.date.available |
2018-02-19T20:33:47Z |
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dc.date.issued |
2012 |
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dc.identifier.citation |
Degradation of phenolic compounds in water by non-thermal plasma treatment / Hsu-Hui Cheng, Shiao-Shing Chen, Kazuharu Yoshizuka, Yung-Chih Chen // Химия и технология воды. — 2012. — Т. 34, № 4. — С. 304-319. — Бібліогр.: 24 назв. — англ. |
uk_UA |
dc.identifier.issn |
0204-3556 |
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dc.identifier.uri |
http://dspace.nbuv.gov.ua/handle/123456789/130717 |
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dc.description.abstract |
A stainless-steel hollow needle type anode was used in the reactor to treat industrial wastewater by gas-liquid phase non-thermal plasma by corona discharge. The results showed that the short electrode gap, 1 cm, has a higher plasma energy density which improves the removal of the phenolic derivatives, reaching 100% after about 60 min. The H₂O₂ concentration was higher in the discharge system when the content of oxygen was increased. The efficiency of the phenol removal by chemical oxygen demand was only 10 – 31% after 60 minutes. The identifie dinterme diates were catechol, hydroquinone,1,4-benzoquinone, 2-nitrophenol,1,2-benzenedicarboxylic acid, diphenylmethanone, 2-methyl-hydroquinone, 2-methyl-1,4-bezoquinone, and trace amounts of organic. |
uk_UA |
dc.language.iso |
en |
uk_UA |
dc.publisher |
Інститут колоїдної хімії та хімії води ім. А.В. Думанського НАН України |
uk_UA |
dc.relation.ispartof |
Химия и технология воды |
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dc.subject |
Физическая химия процессов обработки воды |
uk_UA |
dc.title |
Degradation of phenolic compounds in water by non-thermal plasma treatment |
uk_UA |
dc.type |
Article |
uk_UA |
dc.status |
published earlier |
uk_UA |
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