Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire

dc.contributor.author	Vovk, E.A.
dc.date.accessioned	2017-06-05T19:14:19Z
dc.date.available	2017-06-05T19:14:19Z
dc.date.issued	2015
dc.identifier.citation	Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ.	uk_UA
dc.identifier.issn	1027-5495
dc.identifier.other	DOI: http://dx.doi.org/10.15407/fm22.01.110
dc.identifier.uri	http://dspace.nbuv.gov.ua/handle/123456789/119306
dc.description.abstract	Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830.	uk_UA
dc.language.iso	en	uk_UA
dc.publisher	НТК «Інститут монокристалів» НАН України	uk_UA
dc.relation.ispartof	Functional Materials
dc.subject	Technology	uk_UA
dc.title	Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire	uk_UA
dc.type	Article	uk_UA
dc.status	published earlier	uk_UA