Analysis of methods for high-speed forming the relief microimages on metallic substrates

dc.contributor.author	Kryuchin, A.A.
dc.contributor.author	Pankratova, A.V.
dc.contributor.author	Kassko, I.A.
dc.contributor.author	Nagorny, F.V.
dc.contributor.author	Chirkov, D.V.
dc.date.accessioned	2017-05-29T19:32:28Z
dc.date.available	2017-05-29T19:32:28Z
dc.date.issued	2007
dc.identifier.citation	Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ.	uk_UA
dc.identifier.issn	1560-8034
dc.identifier.other	PACS 42.40.Ht, 42.79.Vb, 81.65.Cf
dc.identifier.uri	http://dspace.nbuv.gov.ua/handle/123456789/118339
dc.description.abstract	The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists.	uk_UA
dc.language.iso	en	uk_UA
dc.publisher	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України	uk_UA
dc.relation.ispartof	Semiconductor Physics Quantum Electronics & Optoelectronics
dc.title	Analysis of methods for high-speed forming the relief microimages on metallic substrates	uk_UA
dc.type	Article	uk_UA
dc.status	published earlier	uk_UA