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Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters

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dc.contributor.author Sarikov, A.
dc.contributor.author Naseka, V.
dc.date.accessioned 2017-05-29T14:12:23Z
dc.date.available 2017-05-29T14:12:23Z
dc.date.issued 2012
dc.identifier.citation Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters / Sarikov, V. Naseka // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 8-12. — Бібліогр.: 11 назв. — англ. uk_UA
dc.identifier.issn 1560-8034
dc.identifier.other PACS 61.72, 81.65.Tx
dc.identifier.uri http://dspace.nbuv.gov.ua/handle/123456789/118257
dc.description.abstract In this work, the gettering process in the multicrystalline Si wafers by the combined getter structures of the porous Si and Al layers during annealings at temperatures 600 up to 750 °C has been theoretically studied. A kinetic model based on the diffusion equation has been developed, and the characteristics of increase in the minority charge carrier diffusion length as a result of gettering annealings have been determined. The obtained results are useful for technology of multicrystalline Si solar cells to improve their properties. uk_UA
dc.description.sponsorship This work has been carried out in the framework of the State Targeted Scientific and Technological Program “Creation of Chemical and Metallurgical Branch of the Production of Pure Silicon Material” during 2011 to 2015 (project − 3.31 “Development and implementation of the technology for the formation of stress-free homogeneous Si ingots”) uk_UA
dc.language.iso en uk_UA
dc.publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України uk_UA
dc.relation.ispartof Semiconductor Physics Quantum Electronics & Optoelectronics
dc.title Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters uk_UA
dc.type Article uk_UA
dc.status published earlier uk_UA


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