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dc.contributor.author |
Bunak, S.V. |
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dc.contributor.author |
Ilchenko, V.V. |
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dc.contributor.author |
Melnik, V.P. |
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dc.contributor.author |
Hatsevych, I.M. |
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dc.contributor.author |
Romanyuk, B.N. |
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dc.contributor.author |
Shkavro, A.G. |
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dc.contributor.author |
Tretyak, O.V. |
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dc.date.accessioned |
2017-05-26T13:09:03Z |
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dc.date.available |
2017-05-26T13:09:03Z |
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dc.date.issued |
2011 |
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dc.identifier.citation |
Electrical properties of MIS structures with silicon nanoclusters / S.V. Bunak, V.V. Ilchenko, V.P. Melnik, I.M. Hatsevych, B.N. Romanyuk, A.G. Shkavro, O.V. Tretyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 2. — С. 241-246. — Бібліогр.: 10 назв. — англ. |
uk_UA |
dc.identifier.issn |
1560-8034 |
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dc.identifier.other |
PACS 72.20.Ee, 73.40.Qv |
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dc.identifier.uri |
http://dspace.nbuv.gov.ua/handle/123456789/117722 |
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dc.description.abstract |
The theoretical and experimental investigations of electrical properties of the
Al-SiO₂-( − ncsSi -SiO₂-Si structures grown using high temperature annealing SiOx, x < 2, have been carried out. It has been experimentally found that the Al-SiO₂-( − ncsSi )-SiO₂-Si structures with the tunnel dielectric layer revealed the effect of dynamic memory. Electric properties and parameters of the interface states located between − ncsSi and SiO₂ were studied in detail by measuring of current-voltage, capacitance-voltage, and thermally stimulated current characteristics. |
uk_UA |
dc.description.sponsorship |
This work was supported by Grant №M/90–2010 of Ministry for Education and Science of Ukraine. |
uk_UA |
dc.language.iso |
en |
uk_UA |
dc.publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
uk_UA |
dc.relation.ispartof |
Semiconductor Physics Quantum Electronics & Optoelectronics |
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dc.title |
Electrical properties of MIS structures with silicon nanoclusters |
uk_UA |
dc.type |
Article |
uk_UA |
dc.status |
published earlier |
uk_UA |
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