Перегляд за автором "Reshetnyak, E.N."

Сортувати за: Порядок: Результатів:

  • Aksyonov, D.S.; Aksenov, I.I.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel’nitskij, V.E. (Вопросы атомной науки и техники, 2011)
    Composite films were formed by vacuum-arc method using two plasma sources equipped with aluminum and titanium cathodes. The sources were coupled with a dual channel T-shaped magnetic filter. Ability of Ti-Al-N films ...
  • Vasyliev, V.V.; Goltvyanytsya, V.S.; Goltvyanytsya, S.K.; Luchaninov, A.A.; Marinin, V.G.; Reshetnyak, E.N.; Strel'nitskij, V.E.; Tolmachоva, G.N. (Вопросы атомной науки и техники, 2015)
    The multicomponent nitride coatings based on TiN and (Ti, Al)N with small additions of Y, Re, Ni, Cr, Si, Mo, Fe synthesized by the PIII&D method from the filtered cathodic-arc plasma. The crystalline nitride phase in all ...
  • Kuprin, A.S.; Belous, V.A.; Morozov, O.M.; Ovcharenko, V.D.; Dub, S.N.; Tolmachova, G.N.; Reshetnyak, E.N.; Zhurba, V.I.; Progolaieva, V.O. (Вопросы атомной науки и техники, 2017)
    The methods of X-ray diffraction analysis, atomic-force microscopy, nanoindentation and thermodesorption spectroscopy have been applied to investigate the effect of a dose (from 5∙10¹⁶ to 1.5∙10¹⁸ D/сm²) of implanted ...
  • Kalinichenko, A.I.; Perepelkin, S.S.; Reshetnyak, E.N.; Strel’nitskij, V.E. (Вопросы атомной науки и техники, 2018)
    In the model of the nonlocal thermoelastic peak of low-energy ion, the formation of intrinsic stress in the coating deposited from inclined ion beam at the pulsed bias potential with different values of pulse frequency f ...
  • Aksyonov, D.S.; Aksenov, I.I.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel’nitskij, V.E. (Вопросы атомной науки и техники, 2011)
    Ti-Al-N films were deposited by vacuum arc method. T-shaped magnetic filter with two channels was used for films preparation. Deposition was performed after aluminum and titanium separate plasma streams from two plasma ...
  • Zavaleyev, V.; Walkowicz, J.; Aksyonov, D.S.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel’nitskij, V.E. (Вопросы атомной науки и техники, 2014)
    Comparative studies of the structure, mechanical and tribological properties of DLC coatings deposited in DC and DC with superimposed high current pulse modes of operation vacuum-arc plasma source with the graphite cathode ...
  • Belous, V.A.; Borodin, O.V.; Bryk, V.V.; Vasilenko, R.L.; Voyevodin, V.N.; Kuprin, A.S.; Ovcharenko, V.D.; Reshetnyak, E.N.; Tolmachova, G.N. (Functional Materials, 2013)
    In this work we studied structure of Ti—20Zr alloy in recrystallized and nanocrystalline conditions before and after irradiation by Zr³⁺ ions with energy 1.8 MeV to 80 dpa at 500° C. By transmission electron microscopy ...
  • Vasyliev, V.V.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel’nitskij, V.E.; Lorentz, B.; Reichert, S.; Zavaleyev, V.; Walkowicz, J.; Sawczak, M. (Вопросы атомной науки и техники, 2016)
    Cr-Al-N coatings deposited from the vacuum-arc plasma source with rectilinear macroparticle filter were investigated. Influence of the amplitude of pulsed substrate bias potential in the range of 0…2500 V on the structure ...
  • Lunyov, V.M.; Kuprin, A.S.; Ovcharenko, V.D.; Belous, V.A.; Morozov, A.N.; Ilchenko, A.V.; Tolmachova, G.N.; Reshetnyak, E.N.; Vasilenko, R.L. (Вопросы атомной науки и техники, 2016)
    W, Ta and W-Ta coatings were deposited by argon ion sputtering of targets made from appropriate metals using the gas plasma source. Mechanical properties of the obtained coatings were investigated by the methods of X-ray ...
  • Vus, A.S.; Malykhin, S.V.; Pugachev, A.T.; Reshetnyak, E.N.; Azhazha, R.V.; Kovtun, K.V. (Functional Materials, 2007)
    The 0.05-0.5 μm trick films have been obtained from GFE-1 grade hafnium target by magnetron sputtering using argon ions. Purity of the obtained films was controlled by X-ray fluorescence spectroscopy. The structure of films ...
  • Reshetnyak, E.N. (Вопросы атомной науки и техники, 2014)
    The results of investigations of the structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings deposited from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate are presented. It ...
  • Vyrovets, I.I.; Gritsyna, V.I.; Dudnik, S.F.; Opalev, O.A.; Reshetnyak, E.N.; Strel'nitskiy, V.E. (Functional Materials, 2009)
    Diamond films of up to 12 μm thickness have been deposited onto single crystal silicon substrates by CVD method in CH₄/H₂/Ar glow discharge plasma stabilized by magnetic field. X-ray diffraction analysis and atomic force ...
  • Aksyonov, D.S.; Aksenov, I.I.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel’nitskij, V.E. (Вопросы атомной науки и техники, 2009)
    Synthesis of Ti-Si and Ti-Si-N coatings using a filtered vacuum-arc plasma source with consumable titaniumsilicon cathode was investigated. The thickness of films and their elemental composition were defined by means ...