Steblova, O.V.; Evtukh, A.A.; Bratus’, O.I.; Fedorenko, L.L.; Voitovych, M.V.; Lytvyn, O.S.; Gavrylyuk, O.O.; Semchuk, O.Yu.
(Semiconductor Physics Quantum Electronics & Optoelectronics, 2014)
Oxide-assisted growth of Si nanocrystals includes deposition of a siliconenriched
SiOx film at the first stage and annealing at the second one. The ion-plasma
sputtering method has been used for deposition of the SiOx ...