Chegel’, V.I.; Shirshov, Yu.M.; Kostyukevich, S.O.; Shepeliavy, P.E.; Chegel', Yu.V.
(Semiconductor Physics Quantum Electronics & Optoelectronics, 2001)
Surface plasmon resonance (SPR) was first applied for investigation of the initial stage kinetics of the chemical processes in inorganic resist based on thin-film Ag-As₂S₃ structure. This method enabled to measure optical ...