Speckle pattern formation in spatially limited optical systems

dc.contributor.author	Kotov, M.M.
dc.contributor.author	Kurashov, V.N.
dc.contributor.author	Goloborodko, A.A.
dc.date.accessioned	2017-06-14T15:22:12Z
dc.date.available	2017-06-14T15:22:12Z
dc.date.issued	2016
dc.identifier.citation	Speckle pattern formation in spatially limited optical systems / M.M. Kotov, V.N. Kurashov, A.A. Goloborodko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 47-51. — Бібліогр.: 7 назв. — англ.	uk_UA
dc.identifier.issn	1560-8034
dc.identifier.other	DOI: 10.15407/spqeo19.01.047
dc.identifier.other	PACS 42.15.Dp, 42.25.Dd, 42.25.Fx, 42.30.Ms
dc.identifier.uri	http://dspace.nbuv.gov.ua/handle/123456789/121530
dc.description.abstract	The dependences of statistical parameters inherent to speckle patterns on the object roughness and aperture size have been investigated. The experimental results that confirm theoretical dependence quality within the limits of errors were obtained. It has been shown that spatial finiteness of the optical system causes significant changes of transferred field.	uk_UA
dc.language.iso	en	uk_UA
dc.publisher	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України	uk_UA
dc.relation.ispartof	Semiconductor Physics Quantum Electronics & Optoelectronics
dc.title	Speckle pattern formation in spatially limited optical systems	uk_UA
dc.type	Article	uk_UA
dc.status	published earlier	uk_UA