Godlewski, M.; Guziewicz, E.; Kopalko, K.; Łuka, G.; Łukasiewicz, M.I.; Krajewski, T.; Witkowski, B.S.; Gierałtowska, S.
(Физика низких температур, 2011)
We demonstrate that the atomic layer deposition (ALD) technique has large potential to be widely used in a production of ZnO films for applications in electronic, photovoltaic (PV) and optoelectronic devices. Low growth ...