Перегляд за автором "Dahov, A.N."

Сортувати за: Порядок: Результатів:

  • 2D fluid model for interactive development of ICP technological tools 
    Gapon, A.V.; Dahov, A.N.; Dudin, S.V.; Zykov, A.V.; Azarenkov, N.A. (Вопросы атомной науки и техники, 2006)
    The software for ICP device simulation is worked out. Discharge chamber geometry, RF power, pressure and working gas type are the input data. The results of calculation are inductor voltage, ion current density distribution ...
  • Development of arc suppression technique for reactive magnetron sputtering 
    Dudin, S.V.; Farenik, V.I.; Dahov, A.N.; Walkowicz, J. (Физическая инженерия поверхности, 2005)
    The technique of arc suppression on the target surface of magnetron sputtering system during reactive deposition of Al₂O₃ coatings has been developed. Damping of arcs is achieved by transient polarity change of the ...
  • Experimental research of ICP reactor for plasma-chemical etching 
    Dudin, S.V.; Zykov, A.V.; Dahov, A.N.; Farenik, V.I. (Вопросы атомной науки и техники, 2006)
    The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, ...
  • Spatial distributions of plasma parameters in ICP reactor 
    Dudin, S.V.; Dahov, A.N.; Farenik, V.I. (2010)
    The results of systematic experimental researches of ICP reactor are presented. Experimental results on spatial distribution of local plasma parameters (plasma density, temperature and electron energy distribution function) ...